International Venture for Nanolithography (INVENT)
The International Venture for Nanolithography (INVENT)
initiative is a first-of-its-kind, global industry-university consortium for research and development, education and technology deployment for future generations of nanolithography applications at the College of Nanoscale Science and Engineering. This highly synergistic approach will accelerate product development and quicken the time to market, making New York’s statewide high-tech economy more competitive than ever.
School, college, division or unit: College of Nanoscale Science and Engineering