International Multiphase Program for Lithography Science and Engineering (IMPLSE)

The $400 million International Multiphase Program for Lithography Science and Engineering (IMPLSE)was established at the College of Nanoscale Science and Engineering as a collaborative effort between CNSE, ASML and IBM, with a focus on 193nm immersion and EUV technologies.

Contact: Kristin Haacker
Phone: (518) 956-7415
Email: khaacker@uamail.albany.edu
Website: http://cnse.albany.edu/LeadingEdgeResearchandDevelopment/InternationalMultiphaseProgramforLithography.aspx
School, college, division or unit: College of Nanoscale Science and Engineering
Partners: ASML, IBM