The technique of ion implantation is extensively used in industrial activity for shooting foreign atoms into a material.
This can be used in such diverse applications as hardening the surfaces of real devices and creating doped layers within computer chips, but in this laboratory it is mostly used to create test samples for entirely new applications.
We have ion implantation systems set up on two different accelerators. The Dynamitron is used for high-energy implantation. The Extrion accelerator is used for low-to-medium energy implantation.