As silicon wafers grow in diameter, new methods need to be developed to handle the larger wafers. When the Global 450 Consortium required RBS analysis on uncut 450 MM wafers, The University At Albany's Ion Beam Laboratory provided the chamber to handle the task.
RBS with better than 100 angstroms resolution!
The Albany HIRRBS system is at its best for analyzing films below 100 angstroms thickness. System energy resolution is approximately 3 keV, while the best conventional techniques achieve no better than 10 keV. A typical example is shown in the link listed below.