Inventions

Reflecting UAlbany’s growing research strength, ten U.S. patents were issued during the 1999 – 2000 fiscal year for inventions by faculty. Seven of the patents were for new processes or new materials developed through research at the Institute for Materials; two were an outgrowth of work in the Department of Physics; the other patent was an outgrowth of work at the University’s Atmospheric Sciences Research Center (ASRC).

University faculty also submitted three invention disclosures and filed nine patent applications with the U.S. Patent and Trademark Office in the past year.

The ten patents issued are:

  • Patent No. 5,919,531, "Tantalum and Tantalum-Based Films and Methods of Making the Same," issued on July 6, 1999, inventors Alain E. Kaloyeros and Barry C. Arkles.

  • Patent No. 5,959,358, "Oxidation Resistant High Conductivity Copper Layers for Microelectronic Applications and Process of Making Same," issued on September 28, 1999, inventors William A. Lanford and Peijun Ding (an outgrowth of work in the Department of Physics).

  • Patent No. 5,968,611, "Silicon-Nitrogen Based Films and Method of Making the Same," issued on October 19, 1999, inventors Alain E. Kaloyeros and Barry C. Arkles.

  • Patent No. 5,986,120, "Metal Trifilmide Complexes," issued November 16, 1999, inventors John T. Welch, Rolf Claessen and Silvana Ngo.

  • Patent No. 6,037,001, "Method for the Chemical Vapor Deposition of Copper-Based Films," issued March 14, 2000, inventors Alain E. Kaloyeros and Barry C. Arkles.

  • Patent No. 6,037,758, "Load Controller and Method to Enhance Effective Capacity of a Photovoltaic Power Supply," issued March 14, 2000, inventor Richard Perez (an outgrowth of work at the ASRC).

  • Patent No. 6,057,223, "Passivated Copper Conductor Layers for Microelectronic Applications," issued May 2, 2000, inventors William Lanford, Wei Wang and Peijun Ding (an outgrowth of work in the Department of Physics).

  • Patent No. 6,060,400, "Highly Selective Chemical Dry Etching of Silicon Nitride over Silicon and Silicon Dioxide," issued May 9, 2000, inventors Gottlieb Oehrlein, Peter Matsuo and Bernd Kastenmeier.

  • Patent No. 6,066,196, "Method for the Chemical Vapor Deposition of Copper-Based Films and Copper Source Precursors for the Same," issued May 23, 2000, inventors Alain E. Kaloyeros and Barry C. Arkles.

  • Patent No. 6,077,571, "Conformal Pure and Doped Aluminum Coatings and a Methodology and Apparatus for Their Preparation," issued June 20, 2000, inventors Alain E. Kaloyeros and Jonathan Faltermeier.

Royalty income totaling $339,248 was received under various agreements in place during this fiscal year.


Contents: Research@UAlbany University at Albany